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| Soft lithography |
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Soft lithography
employs an elastomeric stamp (or mold) to fabricate micro- and nano-structures by patterning Self-Assembled Monolayers (SAM), polymers, colloids, solids, proteins and cells. We use
micro-contact printing
to pattern substrates with SAM and hence to form patterns of varied surface tension [*** see projects on
pattern replication].
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| Spin-coating |
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Spin-coating
is used to prepare thin (nanometer) polymer films by depositing polymers dissolved in a common solvent onto a spinning substrate (wafer) [*** e.g., see
projects on solvent casting effects].
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| SIMS |
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Dynamic !!! Secondary Ion Mass Spectrometry (SIMS) !!!
is used to obtain spatial distribution of various polymer blend components (monitored simultaneously by different secondary ions) in thin films.
Profiling SIMS mode
reveals concentration vs. depth profiles with a nanometer resolution [*** e.g., see projects on wetting phase transition, tuned self-stratification and phase evolution].
Mapping SIMS mode determines true 3-dim phase domain structure with a submicron resolution [*** see projects on 2- and 3-dim imaging, pattern replication].
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| Atomic /Lateral Force Microscopy |
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Atomic /Lateral Force Microscopy
let us probe topography (AFM) and local domain structure (LFM) at the free surface, as well as approximate 3-dim phase structure in the bulk of polymer blend film (AFM combined with selective dissolution of various blend components) [*** see projects on 2- and 3-dim imaging, solvent casting effects, pattern replication].
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| Nuclear Reaction Analysis |
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Nuclear Reaction Analysis
allows us to determine, with a nanometer precision, spatial distribution of the deuterated (i.e. labeled by 3He) polymer in the direction z perpendicular to the polymer blend surface [*** see projects on wetting phase transition, tuned self-stratification and phase evolution]
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